Patent · US Active

Annealing system and annealing method integrated with laser and microwave

US11889609B2 · kind B2 · utility

0Cited by
1References
17Claims
0Family size

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Key dates

Filing dateMay 12, 2022
Grant dateJan 30, 2024
Priority date
Expiry dateJul 29, 2042

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY02P10/25
  • WIPO fieldMachine tools
  • WIPO sectorMechanical engineering

Abstract

Disclosed is an annealing system integrated with laser and microwave. The annealing system is provided with a microwave system, a laser system, and a measurement and control system. The microwave system provides a microwave energy to a first area of a to-be-annealed object for annealing the first area of the to-be-annealed object. The laser system uses a laser to provide a laser energy to a second area of the to-be-annealed object for annealing the second area of the to-be-annealed object. The measurement and control system monitors and controls a power of a microwave and/or a laser. The annealing system is capable of reducing a time required for an overall annealing, and also capable of avoiding cracks or defects caused by large stress differences.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.