Monolayer deposition of nanoparticles
US11890640B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jan 21, 2021 |
| Grant date | Feb 6, 2024 |
| Priority date | — |
| Expiry date | Jan 21, 2041 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB05D1/18
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
Methods of forming a monolayer of nanoparticles are described. The method may include forming an activated surface on a substrate. Methods may also include contacting the activated surface with a fluid including nanoparticles. Methods may further include forming a plurality of monolayers in the liquid on the activated surface. The plurality of nanoparticles may include a first monolayer of nanoparticles bonded to the activated surface. The plurality of nanoparticles may include a second monolayer of nanoparticles bonded to the first monolayer of nanoparticles. The bond strengths between a nanoparticle and the underlying substrate, between adjacent nanoparticles, and between nanoparticles of adjacent monolayers may be related by a specific relationship. The method may also include removing monolayers of the plurality of monolayers while retaining the first monolayer to form the substrate with the first monolayer. Systems for performing the methods and substrates resulting from the methods are also described.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.