Method of forming a multilayer substrate comprising a layer of silicon and a layer of diamond having an optically finished (or a dense) silicon-diamond interface

US11891691B2 · kind B2 · utility

Assignee

• II-VI DELAWARE, INC. · US

Inventors

• Wen-Qing Xu · Sarver, US
• Chao Liu · Butler, US
• Giovanni Barbarossa · Saratoga, US
• Thomas E. Anderson · Normal, US
• Elgin E. Eissler · Renfrew, US

Key dates

• Filing date: Mar 18, 2022
• Grant date: Feb 6, 2024
• Expiry date: Mar 18, 2042

Classification

• Technology area (CPC C): Chemistry; Metallurgy
• CPC primary: C23C16/56
• WIPO field: Surface technology, coating
• WIPO sector: Chemistry

Abstract

A method of making a multilayer substrate, which can include a silicon layer having an optically finished surface and a chemical vapor deposition (CVD) grown diamond layer on the optically finished surface of the silicon layer. At the interface of the silicon layer and the diamond layer, the optically finished surface of the silicon layer can have a surface roughness (Ra)≤100 nm. A surface of the grown diamond layer opposite the silicon layer can be polished to an optical finish and a light management coating can be applied to the polished surface of the grown diamond layer opposite the silicon layer. A method of forming the multilayer substrate is also disclosed.