Platform gauge instrument and platform gauge measuring method based on photogrammetric principle
US11892293B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | May 17, 2023 |
| Grant date | Feb 6, 2024 |
| Priority date | — |
| Expiry date | May 17, 2043 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG06T2207/30244
- WIPO fieldAudio-visual technology
- WIPO sectorElectrical engineering
Abstract
A platform gauge instrument and a platform gauge measuring method based on a photogrammetric principle are provided. According to the platform gauge instrument, measuring stations are arranged on both sides of a platform, and the measuring stations on both sides work together to ensure the acquisition of complete platform information. The measuring stations have automatic traveling capability to complete scanning of a whole platform, platform information obtained by the scanning is automatically resolved by a measuring system, and gauge dimensions such as a transverse dimension and a vertical dimension of a platform gauge are resolved through parameters such as object-space coordinates of platform edge points, a space equation of intersection lines of upper surfaces of rails and a measuring cross-section, and common tangent lines of the upper surfaces of two rails on the measuring cross-section, so that resident and real-time gauge high-precision detection of the platform is achieved.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.