Patent · US Active

Filter device for the filtration of gases contaminated with particles

US11896919B2 · kind B2 · utility

0Cited by

0References

24Claims

0Family size

Assignee

HYDAC FLUIDCARECENTER GMBH · DE

Inventors

Daniel Kleemann · Alsting, FR
Martin Freidinger · Riegelsberg, DE
Jörg Michael Wendels · Riegelsberg, DE
Christophe Hainka · Spicheren, FR
Andre Schneider · Moissac, FR

Key dates

Filing date	Mar 11, 2019
Grant date	Feb 13, 2024
Priority date	—
Expiry date	Feb 25, 2041

Classification

Technology area (CPC Y)Emerging Cross-Sectional Technologies
CPC primaryY02P10/25
WIPO fieldChemical engineering
WIPO sectorChemistry

Abstract

A filter device is for the filtration of gases contaminated with particles, such as welding gases, in particular produced in manufacturing processes using 3D printers in a production room (52). The filter device has a filter circuit having at least one filter element (55, 56), which filters the particles from the gas. At least a part of those particles get from this filter element (55, 56) into an assignable receptacle (59). The particles within a back-flushing process get into the respective receptacle (59). At least one further filter circuit has at least one further filter element (NF1, NF2 that filters a fluid having the particles obtained at the back-flushing process.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.