Patent · US Active

Electrical contacting and method for producing an electrical contacting

US11897758B2 · kind B2 · utility

0Cited by
0References
15Claims
0Family size

Assignee

Inventors

Key dates

Filing dateJun 25, 2019
Grant dateFeb 13, 2024
Priority date
Expiry dateMay 12, 2040

Classification

  • Technology area (CPC B)Performing Operations; Transporting
  • CPC primaryB81B2207/095
  • WIPO fieldMicro-structural and nano-technology
  • WIPO sectorChemistry

Abstract

An electrical contacting between a surrounding wiring and a conductor region. The conductor region is situated in a conductor layer above an SOI wafer or SOI chip. A cover layer is situated above the conductor layer and below the surrounding wiring. The cover layer has a contacting region. The contacting region is insulated from the rest of the cover layer by a first configuration of recesses. An opening is formed at least in the contacting region. A metallic material is situated in the opening. The metallic material connects the surrounding wiring and the conductor region.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.