Electrical contacting and method for producing an electrical contacting
US11897758B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jun 25, 2019 |
| Grant date | Feb 13, 2024 |
| Priority date | — |
| Expiry date | May 12, 2040 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB81B2207/095
- WIPO fieldMicro-structural and nano-technology
- WIPO sectorChemistry
Abstract
An electrical contacting between a surrounding wiring and a conductor region. The conductor region is situated in a conductor layer above an SOI wafer or SOI chip. A cover layer is situated above the conductor layer and below the surrounding wiring. The cover layer has a contacting region. The contacting region is insulated from the rest of the cover layer by a first configuration of recesses. An opening is formed at least in the contacting region. A metallic material is situated in the opening. The metallic material connects the surrounding wiring and the conductor region.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.