Electro optical devices fabricated using deep ultraviolet radiation
US11899293B2 · kind B2 · utility
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19Claims
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Key dates
| Filing date | May 11, 2020 |
| Grant date | Feb 13, 2024 |
| Priority date | — |
| Expiry date | Nov 10, 2041 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/38
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An optical device is described. At least a portion of the optical device includes ferroelectric non-linear optical material(s) and is fabricated utilizing ultraviolet lithography. In some aspects the at least the portion of the optical device is fabricated using deep ultraviolet lithography. In some aspects, the short range root mean square surface roughness of a sidewall of the at least the portion of the optical device is less than ten nanometers. In some aspects, the at least the portion of the optical device has a loss of not more than 2 dB/cm.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.