Patent · US Active

Method for measuring photomasks

US11899358B2 · kind B2 · utility

0Cited by

2References

20Claims

0Family size

Assignee

Carl Zeiss SMT GmbH · DE

Inventors

Dmitry Simakov · Jena, DE
Thomas Thaler · Jena, DE
Steffen Steinert · Jena, DE
Dirk Beyer · Palo Alto, US
Ute Buttgereit · Jena, DE

Key dates

Filing date	Feb 17, 2021
Grant date	Feb 13, 2024
Priority date	—
Expiry date	Mar 1, 2041

Classification

Technology area (CPC G)Physics
CPC primaryG03F9/7073
WIPO fieldOptics
WIPO sectorInstruments

Abstract

The invention relates to a method for measuring a photomask for semiconductor lithography, including the following steps:

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.