Creating effects based on facial features
US11900545B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jan 6, 2022 |
| Grant date | Feb 13, 2024 |
| Priority date | — |
| Expiry date | Jan 6, 2042 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG06T2207/10016
- WIPO fieldComputer technology
- WIPO sectorElectrical engineering
Abstract
The present disclosure describes techniques for creating effects based on facial features. A mesh comprising a set of vertices based on detecting key points of at least one facial part may be created. A mask may be created based on rendering the mesh. A filter may be created by applying a function to a texture based on the mask. A portion of at least one image may be extracted based at least in part on the mask. The portion may correspond to the at least one facial part. An effect may be created on the extracted portion using the filter.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.