Patent · US Active

Imaging systems and methods useful for patterned structures

US11900595B2 · kind B2 · utility

0Cited by
1References
16Claims
0Family size

Assignee

Inventors

Key dates

Filing dateMay 5, 2021
Grant dateFeb 13, 2024
Priority date—
Expiry dateJul 4, 2042

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG06F2218/08
  • WIPO fieldComputer technology
  • WIPO sectorElectrical engineering

Abstract

Disclosed herein, inter alia, are methods and systems of image analysis useful for identifying and/or quantifying features in patterns.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.