Chemical vapor deposition process for producing diamond
US11905594B2 · kind B2 · utility
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10References
18Claims
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Key dates
| Filing date | Sep 2, 2020 |
| Grant date | Feb 20, 2024 |
| Priority date | — |
| Expiry date | Sep 2, 2040 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY02T90/12
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A chemical vapor deposition (CVD) process for producing diamond includes providing a CVD Growth Chamber containing a growth substrate, charging the CVD growth chamber with a source gas mixture that includes a carbon source gas, activating the gas mixture to facilitate growth of diamond on the growth substrate, and providing for a period of diamond growth in a static mode during which the gas mixture is sealed within the CVD growth chamber.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.