Real time registration in lithography system
US11906903B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jun 29, 2020 |
| Grant date | Feb 20, 2024 |
| Priority date | — |
| Expiry date | Jun 29, 2040 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F9/7096
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A device for measuring reference points in real time during lithographic printing includes a light source providing an exposure beam; a light modulator modulating the exposure beam according to an exposure pattern; a measurement system configured to measure a position of a number of alignment marks previously arranged on a substrate; and an exposure optical system comprising a control unit. The exposure optical system delivers the modulated exposure beam as an image provided by the light modulator onto the substrate. The exposure system control unit is configured to calculate the orientation of the substrate based on the position of the alignment marks and control the delivering of the modulated exposure beam relative to the calculated orientation of the substrate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.