Texture recognition device and manufacturing method thereof
US11908226B2 · kind B2 · utility
Assignees
Inventors
Key dates
| Filing date | Nov 28, 2019 |
| Grant date | Feb 20, 2024 |
| Priority date | — |
| Expiry date | Jun 13, 2041 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02B5/285
- WIPO fieldComputer technology
- WIPO sectorElectrical engineering
Abstract
A texture recognition device and a manufacturing method thereof are provided. The texture recognition device includes a backlight component and a photosensitive component. The photosensitive component is on a light-outputting side of the backlight component and configured to detect light emitted by the backlight component and reflected by a texture of a detection object to recognize an image of the texture of the detection object. The photosensitive component includes a plurality of photosensitive sensors and an antistatic layer on a side, away from the backlight component, of the plurality of photosensitive sensors, and orthographic projections of the plurality of photosensitive sensors on a plane where the antistatic layer is located are within the antistatic layer.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.