Multi charged particle beam writing apparatus
US11908659B2 · kind B2 · utility
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16Claims
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Key dates
| Filing date | Jun 8, 2022 |
| Grant date | Feb 20, 2024 |
| Priority date | — |
| Expiry date | Aug 18, 2042 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/0435
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
In one embodiment, a multi charged particle beam writing apparatus includes a blanking aperture array substrate provided with a plurality of blankers configured to respectively perform blanking deflection on a plurality of charged particle beams included in a multi-beam, and a first shield member which is disposed downstream of the blanking aperture array substrate with respect to a travel direction of the multi-beam, has a cylindrical part in which the multi-beam passes through, and is composed of a high magnetic permeability material.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.