Controlling porosity of an interference lithography process by fine tuning exposure time
US11914304B2 · kind B2 · utility
Assignees
Inventors
Key dates
| Filing date | Aug 5, 2021 |
| Grant date | Feb 27, 2024 |
| Priority date | — |
| Expiry date | Jan 13, 2042 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03H1/12
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method to control the density of a three-dimensional photonic crystal template involves changing the irradiation time from at least four laser beams to yield a periodic percolating matrix of mass and voids free of condensed matter from a photoresist composition. The photoresist composition includes a photoinitiator at a concentration where the dose or irradiation is controlled by the irradiation time and is less than the irradiation time that would convert all photoinitiator to initiating species such that the density of the three-dimensional photonic crystal template differs for different irradiation times. A deposition of reflecting or absorbing particles can be patterned on the surface of the photoresist composition to form a template with varying densities above different areas of the substrate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.