Method for manufacturing projection screen and projection screen
US11921412B2 · kind B2 · utility
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17Claims
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Key dates
| Filing date | Nov 18, 2019 |
| Grant date | Mar 5, 2024 |
| Priority date | — |
| Expiry date | Jan 29, 2041 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C14/35
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A method for manufacturing a projection screen and a projection screen are provided. The method includes: preparing a substrate; under a first preparation condition, forming a reflective layer by vacuum plating above the substrate; and under a second preparation condition, forming a diffusion layer by the vacuum plating on the reflective layer. The second preparation condition is different from the first preparation condition, and a sputtering power in the second preparation condition is higher than a sputtering power in the first preparation condition.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.