Autonomous concentration control systems and methods of controlling concentration of a gas or particle mixture
US11921524B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Apr 14, 2021 |
| Grant date | Mar 5, 2024 |
| Priority date | — |
| Expiry date | Sep 17, 2041 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG05B15/02
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
A method of controlling a concentration or range of concentrations of a liquid or gas in an enclosure is provided. The method includes positioning an injection station within the enclosure. the injection station includes a liquid or gas source, a sprayer assembly and a system that delivers the liquid or gas from the liquid or gas source to the sprayer assembly. A concentration level of the liquid or gas in the environment surrounding the injection station is monitored using a sensor and the sensor providing a signal indicative of the concentration level to a controller. The controller controls the flow of the liquid or gas to the sprayer assembly based on the signal.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.