Patent · US Active

Self-cleaning fabric and article

US11925928B2 · kind B2 · utility

0Cited by

0References

19Claims

0Family size

Assignee

CITY UNIVERSITY OF HONG KONG · CN

Inventors

Jin Shang · Sunnyvale, US
Tianqi Wang · Sunnyvale, US
Mingzhe Sun

Key dates

Filing date	Jun 17, 2022
Grant date	Mar 12, 2024
Priority date	—
Expiry date	Jun 17, 2042

Classification

Technology area (CPC B)Performing Operations; Transporting
CPC primaryB01J2531/26
WIPO fieldChemical engineering
WIPO sectorChemistry

Abstract

A self-cleaning fabric having a photocatalyst responsive to UV, visible and IR irradiations for inactivating harmful microorganisms via photocatalysis.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.