Patent · US Active

Cast films comprising bimodal ethylene-based polymers having high molecular weight high density fractions

US11926684B2 · kind B2 · utility

0Cited by

39References

17Claims

0Family size

Assignee

DOW GLOBAL TECHNOLOGIES LLC · US

Inventors

Kyle E. Hart · Manvel, US
Mehmet Demirors · Terneuzen, NL
Timothy W. Gambrel · Lake Jackson, US
Philip P. Fontaine · Alvin, US
Vivek Kalihari · Missouri City, US
Hrishikesh R. Munj · Lake Jackson, US
Jon W. Hobson · Freeport, US
Rajen M. Patel · Lake Jackson, US

Key dates

Filing date	Jun 13, 2019
Grant date	Mar 12, 2024
Priority date	—
Expiry date	Mar 28, 2041

Classification

Technology area (CPC C)Chemistry; Metallurgy
CPC primaryC08J2323/12
WIPO fieldMacromolecular chemistry, polymers
WIPO sectorChemistry

Abstract

A cast film inducing a bimodal ethylene-based polymer having a high density fraction (HDF) from 3.0% to 10.0%, an I10/I2 ratio from 5.5 to 7.0, a short chain branching distribution (SCBD) less than or equal to 10° C., a density from 0.910 g/cc to 0.920 g/cc, and a melt index (I2) from 1.0 g/10 mins to 8.0 g/10 mins.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.