System, media, and method for deep learning
US11928582B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | Dec 31, 2018 |
| Grant date | Mar 12, 2024 |
| Priority date | — |
| Expiry date | Mar 23, 2041 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG06N3/0464
- WIPO fieldComputer technology
- WIPO sectorElectrical engineering
Abstract
Embodiments of the invention provide a system, media, and method for deep learning applications in physical design verification. Generally, the approach includes maintaining a pattern library for use in training machine learning model(s). The pattern library being generated adaptively and supplemented with new patterns after review of new patterns. In some embodiments, multiple types of information may be included in the pattern library, including validation data, and parameter and anchoring data used to generate the patterns. In some embodiments, the machine learning processes are combined with traditional design rule analysis. The patterns being generated and adapted using a lossless process that encodes the information of a corresponding area of a circuit layout.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.