Materials for metalenses, through-waveguide reflective metasurface couplers, and other metasurfaces
US11933940B1 · kind B1 · utility
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15Claims
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Key dates
| Filing date | Sep 14, 2023 |
| Grant date | Mar 19, 2024 |
| Priority date | — |
| Expiry date | Sep 14, 2043 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02B1/002
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Systems and methods are described herein for manufacturing high-index, low-absorption materials for use in visible light optical metasurfaces. Methods of manufacturing or forming hydrogenated amorphous silicon (a-Si:H), silicon-rich nitride (SRN), and hydrogenated silicon-rich nitride (SRN:H) are described herein that exhibit high indices of refraction and low extinction coefficients for visible wavelengths of optical radiation. Optical metasurfaces, including optical metalenses and waveguide couplers, are described herein that utilize the a-Si:H, SRN, and/or SRN:H materials.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.