Microelectromechanical structure including a functional element situated in a cavity of the microelectromechanical structure
US11939215B2 · kind B2 · utility
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9Claims
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Key dates
| Filing date | Oct 4, 2019 |
| Grant date | Mar 26, 2024 |
| Priority date | — |
| Expiry date | Dec 26, 2040 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB81C2203/0145
- WIPO fieldMicro-structural and nano-technology
- WIPO sectorChemistry
Abstract
A microelectromechanical structure, including a functional element situated in a cavity of the microelectromechanical structure. The functional element includes an aluminum nitride layer. The cavity is closed by a cap layer. The cap layer includes epitaxial silicon. A method for manufacturing a micromechanical structure is also described.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.