Patent · US Active

Microelectromechanical structure including a functional element situated in a cavity of the microelectromechanical structure

US11939215B2 · kind B2 · utility

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1References
9Claims
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Key dates

Filing dateOct 4, 2019
Grant dateMar 26, 2024
Priority date
Expiry dateDec 26, 2040

Classification

  • Technology area (CPC B)Performing Operations; Transporting
  • CPC primaryB81C2203/0145
  • WIPO fieldMicro-structural and nano-technology
  • WIPO sectorChemistry

Abstract

A microelectromechanical structure, including a functional element situated in a cavity of the microelectromechanical structure. The functional element includes an aluminum nitride layer. The cavity is closed by a cap layer. The cap layer includes epitaxial silicon. A method for manufacturing a micromechanical structure is also described.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.