Structure for microbe detection, manufacturing method therefor, and microbe detection method using same structure for microbe detection
US11940446B2 · kind B2 · utility
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7Claims
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Key dates
| Filing date | May 16, 2018 |
| Grant date | Mar 26, 2024 |
| Priority date | — |
| Expiry date | Sep 5, 2040 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N2333/255
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A method for manufacturing a structure for microbe detection comprises the steps of: reacting nitrilotriacetic acid (NTA) and an acid anhydride to prepare a first compound; chelation of metal ions to the first compound to prepare a second compound; binding the second compound and a microbe detector to prepare a third compound; and mixing an exfoliated transition metal-dichalcogenide (TMD) compound and the third compound to prepare a structure for microbe detection, in which the metal ions of the third compound are bound with the transition metal-dichalcogenide compound.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.