Mask protective module, pellicle having the same, and lithography apparatus having the same
US11940726B2 · kind B2 · utility
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4Claims
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Key dates
| Filing date | Jun 28, 2022 |
| Grant date | Mar 26, 2024 |
| Priority date | — |
| Expiry date | Jul 1, 2042 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/027
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A lithography apparatus comprises a light source for emitting light; a mask mounting zone where a mask for reflecting the light is disposed; and a mask protective module disposed on the mask to transmit the light from the light source toward the mask. The mask protective module comprises a frame and a membrane supported by the frame, wherein the membrane includes a penetration region for transmitting the light and a peripheral region of which a light transmittance is lower than that of the penetration region.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.