Active gas generation apparatus
US11942310B2 · kind B2 · utility
0Cited by
13References
3Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Nov 12, 2019 |
| Grant date | Mar 26, 2024 |
| Priority date | — |
| Expiry date | Mar 8, 2041 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05H1/2418
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
In an active gas generation apparatus of the present invention, an auxiliary conductive film provided on a first electrode dielectric film is provided to overlap part of an active gas flow path in plan view, and the auxiliary conductive film is set to the ground potential. An active gas auxiliary member provided on a second electrode dielectric film is provided to fill part of the active gas flow path between a discharge space and a gas ejection hole in a dielectric space between the first and second electrode dielectric films in order to limit to an active gas flow gap.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.