Measurement setup, reference reflector as well as method for measuring attenuation
US11947001B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Feb 18, 2021 |
| Grant date | Apr 2, 2024 |
| Priority date | — |
| Expiry date | Sep 10, 2042 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01S7/4056
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A measurement setup for measuring attenuation through an irregular surface of a device under test is described. The measurement setup includes a positioning system, a reference reflector, and a three dimensional imaging system. The measurement setup has a reference state and a measurement state, wherein respective images are taken in the different states. The imaging system is configured to compare the images taken in the reference state and the measurement state to determine the attenuation of the device under test. Further, a reference reflector as well as a method for measuring attenuation are described.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.