Method and apparatus for electron beam processing control
US11947878B2 · kind B2 · utility
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20Claims
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Key dates
| Filing date | Nov 24, 2020 |
| Grant date | Apr 2, 2024 |
| Priority date | — |
| Expiry date | Oct 10, 2042 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG06F2111/10
- WIPO fieldComputer technology
- WIPO sectorElectrical engineering
Abstract
A digital representation of an object is formed. The properties of incident electrons are calculated from a parameterized source model and the irradiation of the object is simulated. The particle-matter interactions for a material of the object are calculated. The amount of absorbed dose at locations at the object is calculated. The digital representation of the object is modified in response to an input from a user and the modified digital representation of the object is displayed.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.