Power semiconductor device with an auxiliary gate structure
US11955478B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jun 17, 2021 |
| Grant date | Apr 9, 2024 |
| Priority date | — |
| Expiry date | Aug 26, 2042 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10D84/84
- WIPO fieldBasic communication processes
- WIPO sectorElectrical engineering
Abstract
Power semiconductor devices in GaN technology include an integrated auxiliary (double) gate terminal and a pulldown network to achieve a normally-off (E-Mode) GaN transistor with threshold voltage higher than 2V, low gate leakage current and enhanced switching performance. The high threshold voltage GaN transistor has a high-voltage active GaN device and a low-voltage auxiliary GaN device wherein the high-voltage GaN device has the gate connected to the source of the integrated auxiliary low-voltage GaN transistor and the drain being the external high-voltage drain terminal and the source being the external source terminal, while the low-voltage auxiliary GaN transistor has the gate (first auxiliary electrode) connected to the drain (second auxiliary electrode) functioning as an external gate terminal. A pull-down network for the switching-off of the high threshold voltage GaN transistor may be formed by additional auxiliary low-voltage GaN transistors and resistive elements connected with the low-voltage auxiliary GaN transistor.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.