Laser system and method for generating laser pulses with very high repetition rate
US11955766B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jan 10, 2019 |
| Grant date | Apr 9, 2024 |
| Priority date | — |
| Expiry date | Mar 25, 2041 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01S3/2308
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Disclosed is a system and a method for generating high-power laser pulses with very high repetition rate. The laser system includes an oscillator capable of generating a source laser beam including a series of sources pulses with femtosecond or picosecond duration at a first repetition frequency no lower than 800 megahertz and an optical amplifier system suitable for receiving and amplifying the series of source pulses at a second repetition frequency that is equal to or a multiple of the first repetition frequency, the multiple being a non-negative integer greater than or equal to two, so as to generate a series of laser pulses with very high repetition frequency.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.