Elliptical multi-mesa laser structure

US11955774B2 · kind B2 · utility

Assignee

• SHENZHEN TECHNOLOGY UNIVERSITY · CN

Inventors

• Hui Li · Lo Wu, CN
• Jian Feng · Lo Wu, CN
• Chuyu Zhong · Lo Wu, CN
• Wei Miao · Zhangdian District, CN
• Shilong Zhao · Lo Wu, CN
• Zhao Chen · Taichung, TW

Key dates

• Filing date: Jul 1, 2023
• Grant date: Apr 9, 2024
• Expiry date: Jul 1, 2043

Classification

• Technology area (CPC H): Electricity
• CPC primary: H01S5/18358
• WIPO field: Optics
• WIPO sector: Instruments

Abstract

Provided is an elliptical multi-mesa laser structure, including a substrate layer, an N-DBR, a functional layer and a P-DBR sequentially arranged from bottom to top. The substrate layer is fixedly connected with an N contact layer. The N-DBR is fixedly connected to a top of the substrate layer, and the N contact layer is arranged around the N-DBR. A space layer is inserted in the N-DBR. The functional layer is fixedly connected to a top of the N-DBR. The P-DBR is fixedly connected to a top of the functional layer, and a top of the P-DBR is fixedly connected with a P contact layer. Another space layer is inserted into the P-DBR.