Meta-lens structure and method of fabricating the same
US11960051B2 · kind B2 · utility
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18Claims
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Key dates
| Filing date | Oct 14, 2019 |
| Grant date | Apr 16, 2024 |
| Priority date | — |
| Expiry date | Nov 22, 2040 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB81C2201/014
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Various embodiments may provide a method of fabricating a meta-lens structure. The method may include forming a first dielectric layer in contact with a silicon wafer. The method may also include forming a second dielectric layer in contact with the first dielectric layer. A refractive index of the second dielectric layer may be different from a refractive index of the first dielectric layer. The method may further include, in patterning the second dielectric layer. The method may additionally include removing at least a portion of the silicon wafer to expose the first dielectric layer.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.