Aqueous polyurethane functional mask substrate and application thereof
US11964032B2 · kind B2 · utility
Assignees
Inventors
Key dates
| Filing date | Nov 9, 2018 |
| Grant date | Apr 23, 2024 |
| Priority date | — |
| Expiry date | Mar 4, 2040 |
Classification
- Technology area (CPC A)Human Necessities
- CPC primaryA61K2800/594
- WIPO fieldPharmaceuticals
- WIPO sectorChemistry
Abstract
Disclosed by the present invention are an aqueous polyurethane functional mask substrate and an application thereof. Two kinds of water-based polyurethane dispersions are used as the main components of the mask substrate. The transdermal penetration and absorption of functional ingredients such as whitening, moisturizing and anti-aging ingredients in facial mask products are promoted by means of the special cross-linked structures of polyurethane films. During use, a mask is evenly applied to the face; and after the mask dries, the entire mask may be removed directly or removed after being moistened using water. The mask substrate according to the present invention is also applicable to body masks such as a hand mask, a neck mask and a back mask.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.