Patent · US Active

Alpha alumina with high purity and high relative density, a method for its production and its use

US11964878B2 · kind B2 · utility

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10Claims
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Inventors

Key dates

Filing dateJul 24, 2019
Grant dateApr 23, 2024
Priority date
Expiry dateSep 30, 2040

Classification

  • Technology area (CPC C)Chemistry; Metallurgy
  • CPC primaryC04B2235/549
  • WIPO fieldMaterials, metallurgy
  • WIPO sectorChemistry

Abstract

The present invention relates to an alpha alumina having a high purity, a high density and a low surface area and particularly, to a method to produce such an alpha alumina as well as to the use of the alpha alumina in sapphire production or the production of composite and ceramic bodies.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.