Alpha alumina with high purity and high relative density, a method for its production and its use
US11964878B2 · kind B2 · utility
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10Claims
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Key dates
| Filing date | Jul 24, 2019 |
| Grant date | Apr 23, 2024 |
| Priority date | — |
| Expiry date | Sep 30, 2040 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC04B2235/549
- WIPO fieldMaterials, metallurgy
- WIPO sectorChemistry
Abstract
The present invention relates to an alpha alumina having a high purity, a high density and a low surface area and particularly, to a method to produce such an alpha alumina as well as to the use of the alpha alumina in sapphire production or the production of composite and ceramic bodies.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.