Three-dimensional dye, manufacturing method of three-dimensional dye and photoresist mixture
US11965101B2 · kind B2 · utility
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20Claims
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Key dates
| Filing date | Sep 3, 2020 |
| Grant date | Apr 23, 2024 |
| Priority date | — |
| Expiry date | Aug 11, 2042 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/033
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A three-dimensional dye, a manufacturing method of the three-dimensional dye, and a photoresist mixture are disclosed. A non-planar three-dimensional dye molecular structure is constructed by adding a three-dimensional structure group into a dye molecule, thereby breaking the strong attraction force between the planar conjugation of the dye molecule. Aggregation of dye molecules are prevented, influence of dye molecules on optical paths is eliminated, and thus optical properties and color rendering properties of color filters made by a photoresist liquid are improved.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.