System and method for quantifying an exposure dose on surfaces
US11965776B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Aug 10, 2021 |
| Grant date | Apr 23, 2024 |
| Priority date | — |
| Expiry date | Sep 6, 2042 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG06T2207/30156
- WIPO fieldAudio-visual technology
- WIPO sectorElectrical engineering
Abstract
A method for quantifying an exposure dose for a surface is disclosed. The method may include emitting one or more beams of 222 nm light onto a portion of the surface using one or more far ultraviolet (UV) light sources capable of emitting 222 nm light, the portion of the surface being coated with one or more fluorescent coatings. The method may include capturing images of the portion of the surface. The method may include adjusting one or more image characteristics for the captured images using one or more filtering methods. The method may include generating a histogram of the adjusted images based on the one or more filtering methods. The method may include determining a pixel surface area for the generated histogram. The method may include calculating the exposure dose for the surface based on the generated pixel surface area and a predetermined calibration curve.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.