Patent · US Active

EUV light source with a separation device

US11968767B2 · kind B2 · utility

0Cited by

3References

13Claims

0Family size

Assignee

TRUMPF Lasersystems for Semiconductor Manufacturing GmbH · DE

Inventors

Oliver Schlosser · Bonlanden, DE
Stefan Piehler · Stuttgart, DE

Key dates

Filing date	Oct 25, 2023
Grant date	Apr 23, 2024
Priority date	—
Expiry date	Oct 25, 2043

Classification

Technology area (CPC H)Electricity
CPC primaryH05G2/0035
WIPO fieldMedical technology
WIPO sectorInstruments

Abstract

A EUV light source includes a prepulse laser source for emitting a prepulse laser beam at a prepulse wavelength, a main pulse laser source for emitting a main pulse laser beam at a main pulse wavelength, a prepulse beam guiding device for feeding the prepulse laser beam into a radiation generating chamber for irradiation of a target material with a prepulse, and a main pulse beam guiding device for feeding the main pulse laser beam into the radiation generating chamber for irradiation of the target material with a main pulse. The target material is configured to emit EUV radiation on account of the irradiation with the prepulse and the main pulse. The prepulse beam guiding device has a separation device configured to reflect disturbing radiation in a wavelength range that does not include the prepulse wavelength back into the radiation generating chamber or into at least one beam trap.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.