Polymer containing photoacid generator
US11970557B2 · kind B2 · utility
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10Claims
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Key dates
| Filing date | Oct 31, 2019 |
| Grant date | Apr 30, 2024 |
| Priority date | — |
| Expiry date | Apr 29, 2042 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/0395
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A polymer capable of securing pattern uniformity in a photoresist pattern, the polymer containing a photoacid generator by including a structure unit represented by Chemical Formula 1a; and a structure unit represented by Chemical Formula 1b as shown in the specification.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.