Light propagation time pixel and light propagation time sensor with corresponding pixel
US11971506B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Aug 30, 2019 |
| Grant date | Apr 30, 2024 |
| Priority date | — |
| Expiry date | Jul 8, 2041 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01S17/89
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
The disclosure relates to a light propagation time pixel, comprising modulation gates and integration nodes which are arranged on the upper face of a photosensitive semiconductor region. The photosensitive semiconductor region is designed as an N-epitaxy and is delimited laterally and/or at the corners by p-doped vertical p-structures. A buried layer with a p-doping adjoins the lower face of the photosensitive semiconductor region, and the vertical p-structures are in electric contact with the buried layer.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.