Optical parallelism system for extended reality metrology
US11971555B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | Oct 30, 2023 |
| Grant date | Apr 30, 2024 |
| Priority date | — |
| Expiry date | Oct 30, 2043 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02B2027/011
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An optical system including an enclosure including a front end and a rear end, a first pair of apertures configured to be disposed on a front plane on the front end of the enclosure and a single optical lens system disposed between the front end and the rear end of the enclosure, wherein the first pair of apertures are configured to allow sets of light rays into the enclosure through the single optical lens system to be cast on an image plane as first and second spots, the image plane being parallel to the front plane, if the first and second spots are concentrically disposed, the sets of light rays are determined to be parallelly disposed with respect to one another, otherwise the sets of light rays are determined to not be parallelly disposed with one another.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.