Single photon source
US11971576B2 · kind B2 · utility
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20Claims
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Key dates
| Filing date | Dec 5, 2022 |
| Grant date | Apr 30, 2024 |
| Priority date | — |
| Expiry date | Dec 5, 2042 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S977/95
- WIPO fieldBasic materials chemistry
- WIPO sectorChemistry
Abstract
A method for producing a single photon source includes lithographically patterning a polymer on top of a plasmonic thin film, functionalizing top surfaces of the plasmonic thin film and the polymer, removing the polymer to form patterned functionalized sites on the top surface of the plasmonic thin film surface, and depositing nanodiamond particles to the patterned functionalized sites.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.