Patent · US Active

Automated pressure control system and method for a cleaner

US11975343B1 · kind B1 · utility

0Cited by
1References
20Claims
0Family size

Assignee

Inventors

Key dates

Filing dateOct 31, 2022
Grant dateMay 7, 2024
Priority date
Expiry dateOct 31, 2042

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH05K2203/0776
  • WIPO fieldChemical engineering
  • WIPO sectorChemistry

Abstract

A cleaning apparatus includes at least one cleaning module configured to treat electronic substrates and a conveyor system configured to transport the electronic substrates through the at least one cleaning module. The at least one cleaning module includes a fluid management system having a manifold coupled to a source of fluid. The manifold includes at least one outlet. The at least one cleaning module further includes an automatic valve coupled to the at least one outlet and to a conduit leading to one or more first spray nozzles and a pressure sensor coupled to the automatic valve. The pressure sensor is configured to measure pressure of fluid flowing through the conduit. The automatic valve is configured to adjust the flow of fluid through the conduit based on the pressure measured by the pressure sensor.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.