Sensor and its manufacturing method
US11976989B2 · kind B2 · utility
0Cited by
6References
11Claims
0Family size
Assignee
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Key dates
| Filing date | Mar 27, 2020 |
| Grant date | May 7, 2024 |
| Priority date | — |
| Expiry date | Jun 18, 2042 |
Classification
- Technology area (CPC A)Human Necessities
- CPC primaryA61B2562/12
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A strain sensor that includes a first atomic layer deposition layer, a flexible molecular layer deposition layer on top of the first atomic layer deposition layer, and a second atomic layer deposition layer on top of the molecular layer deposition layer.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.