Quartz glass with low content of hydroxyl and high purity and method for preparing the same
US11981594B2 · kind B2 · utility
Assignees
Inventors
Key dates
| Filing date | Dec 9, 2020 |
| Grant date | May 14, 2024 |
| Priority date | — |
| Expiry date | Jul 30, 2041 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC03C2204/00
- WIPO fieldOther special machines
- WIPO sectorMechanical engineering
Abstract
A method for preparing quartz glass with low content of hydroxyl and high purity, includes providing silica powders including hydroxyl groups. The silica powders are dehydroxylated, which includes drying the silica powders at a first temperature, heating the silica powders up to a second temperature and introducing a first oxidizing gas including halogen gas, thereby obtaining first dehydroxylated powders, and heating the first dehydroxylated powders up to a third temperature and introducing a second oxidizing gas including oxygen or ozone, thereby obtaining second dehydroxylated powders. The second dehydroxylated powders are heated up to a fourth temperature to obtain a vitrified body. The vitrified body is cooled to obtain the quartz glass with low content of hydroxyl and high purity. The quartz glass prepared by the above method has low content of hydroxyl and high purity. A quartz glass with low content of hydroxyl and high purity is also provided.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.