Photoacid generator, photoresist composition including the same, and method of preparing the photoacid generator
US11982940B2 · kind B2 · utility
0Cited by
2References
21Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | May 8, 2023 |
| Grant date | May 14, 2024 |
| Priority date | — |
| Expiry date | May 8, 2043 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC07C2603/74
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Disclosed are a photoacid generator, a photoresist composition including the same, and a method of preparing the photoacid generator. The photoacid generator may include a compound represented by Formula 1:
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.