Method for rendering on basis of hemispherical orthogonal function
US11989823B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Sep 14, 2020 |
| Grant date | May 21, 2024 |
| Priority date | — |
| Expiry date | Dec 8, 2040 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG06T15/205
- WIPO fieldComputer technology
- WIPO sectorElectrical engineering
Abstract
The invention discloses a method for rendering on the basis of hemispherical orthogonal function, the method comprising the following steps: selecting rendering fragments and establishing a local coordinate system; acquiring a bidirectional reflectance distribution function of a material; if global illumination is an orthogonal function, determining a rotation matrix of an orthogonal function coefficient according to the rotation angles of the global coordinate system and the local coordinate system, and calculating a local orthogonal function illumination coefficient; converting the local orthogonal function illumination coefficient into a hemispherical orthogonal function illumination coefficient; sampling to obtain the spatial distribution of a bidirectional reflection distribution function of a rendered material; obtaining a hemispherical orthogonal function of the bidirectional reflection distribution function of the rendered material; and using the dot product of a hemispherical orthogonal function coefficient of illumination and a hemispherical orthogonal function coefficient of the bidirectional reflection distribution function of the rendered material and accumulating to o…
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.