Device for radical diagnostic in plasma processing chamber, radical diagnostic system having the same, and operating method thereof
US11996275B2 · kind B2 · utility
0Cited by
10References
18Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Sep 12, 2022 |
| Grant date | May 28, 2024 |
| Priority date | — |
| Expiry date | Sep 12, 2042 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01J2001/446
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A diagnostic device for diagnosing distribution of a radical in a plasma processing chamber, the diagnostic device, may include a spectrometer receiving an optical signal through at least one optical channel connected to the plasma processing chamber, and performing spectral analysis on the optical signal in response to a synchronization signal corresponding to each of states of a multi-level pulse applied to the plasma processing chamber and a synchronizer generating the synchronization signal corresponding to each of the states of the multi-level pulse.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.