Method for producing organometallic compound and thin film fabricated using organometallic compound obtained thereby
US11999756B2 · kind B2 · utility
0Cited by
0References
5Claims
0Family size
Assignees
Inventors
Key dates
| Filing date | Apr 18, 2022 |
| Grant date | Jun 4, 2024 |
| Priority date | — |
| Expiry date | Apr 18, 2042 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C30/00
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
The present invention relates to a method for producing a high yield of an organometallic compound including a step of allowing a metal hexacarbonyl compound to react with a hexahydro-1,3,5-triazine compound, and a thin film having excellent properties, fabricated by depositing the produced organometallic compound.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.