Patent · US Active

Method for manufacturing solar cell

US12002899B2 · kind B2 · utility

0Cited by
4References
11Claims
0Family size

Assignee

Inventors

Key dates

Filing dateNov 2, 2023
Grant dateJun 4, 2024
Priority date
Expiry dateNov 2, 2043

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY02P70/50

Abstract

The present application relates to a method for manufacturing a solar cell. In the method, a wafer including a substrate and a doped conducting layer is provided. A doped conducting layer is disposed at least on the first surface and the portion of the first side surface, thereby covering the textured structure. A passivating contact layer is formed on the second surface of the substrate. A first passivation layer is formed on the doped conducting layer. The first passivation layer covers the first surface and at least the portion of the first side surface, thereby covering at least the doped conducting layer. A second passivation layer is formed on the passivating contact layer. The second passivation layer covers the second surface, thereby covering the passivating contact layer.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.