Patterned apertured nonwoven
US12004933B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Oct 26, 2021 |
| Grant date | Jun 11, 2024 |
| Priority date | — |
| Expiry date | Jun 2, 2042 |
Classification
- Technology area (CPC A)Human Necessities
- CPC primaryA61F2013/51452
- WIPO fieldMedical technology
- WIPO sectorInstruments
Abstract
The present disclosure relates to a nonwoven substrate comprising a plurality of apertures that form a pattern and define a plurality of discrete non-aperture zones. Each of the plurality of discrete non-aperture zones has a periphery formed by a continuous line of apertures, with adjacent apertures being spaced apart by an edge-to-edge distance of no more than 3 mm, while each of the plurality of discrete non-aperture zones is substantially free of apertures within the periphery. Particularly, the area ratio of such plurality of discrete non-aperture zones over the nonwoven substrate ranges from 60% to 90%, and at least some of said plurality of discrete non-aperture zones have an area of 100 mm2 or more.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.