Methods for photocuring liquid resin with reduced heat generation
US12005634B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Jan 26, 2022 |
| Grant date | Jun 11, 2024 |
| Priority date | — |
| Expiry date | Jan 26, 2042 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02F1/31
- WIPO fieldOther special machines
- WIPO sectorMechanical engineering
Abstract
In a vat polymerization printer, a beam scanner scans a light beam across a mask and into a tank containing a photo-curable resin. The mask has pixels configurable to be individually transparent or opaque to portions of the light beam, which has a diameter greater than a cross-sectional dimension of the pixels of the mask. During an exposure time duration, a first subset of the pixels are controlled to be transparent at locations corresponding to the cross section of a three-dimensional object to be printed, while a second subset of the pixels are controlled to be opaque at locations not corresponding to the cross section of the three-dimensional object. The beam scanner is controlled to scan the light beam across the mask such that the light beam is always incident on at least one of the pixels of the mask that are controlled to be transparent.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.